Semiconductor industry requires ultrapure water qualities with extremely low TOC levels of less than 1 ppb or even less than 0.5 ppb TOC. Only UV radiation with special 185 nm UV lamps and special reactors are able to achieve such low levels without adding other impurities in the ultrapure water.
UV ionize organic compounds
The high energy UV lamps initiating a photo oxidation process forming OH radicals which are attacking organic compounds and changing them into ionic ones. The ionized compounds are then easily removed by a subsequent ion exchanger.
Ozone for disinfection and oxidation
Ozone is usable for disinfection and oxidation of the ultrapure water loops specially before the degasification step in the make-up loop. Ozone is also used to oxidize isopropyl alcohol (IPA) to reclaim process water streams.
Beside standardized UV and Ozone systems Xylem develop in coordination with you custom-made solutions for your very special application.
